Semiconductor Integrated Device & Process Lab.

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Ultra-thin <10nm) Dual-oxide (Al2O3/TiO2) Hybrid Device (Memory/Selector) with Extremely Low Ioff <1nA) and Ireset <1nA) for 3D Storage Class Memory / Sung, C., Song, J., Lee, D., Lim, S., Kwak, M., Hwang, H. / 2019 Symposia on VLSI Technology and Circuits.  

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