Semiconductor Integrated Device & Process Lab.


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Atomic Threshold Switch Based on All-2D Material Heterostructures with Excellent Control Over Filament Growth and Volatility / Revannath Dnyandeo Nikam and Hyunsang Hwang / Advanced Functional Materials 32(29) 2201749 (202207) 


Nonvolatile Frequency-Programmable Oscillator with NbO2 and Li-based Electro-Chemical Random Access Memory for Coupled Oscillators-Based Temporal Pattern Recognition System / Donguk Lee, Jongwon Lee, Sangmin Lee,. Chuljun Lee, Sungjae Heo, Hyunsang Hwang / IEEE Electron Device Letters 43(7), pp. 1041-1044 (202207) 


Linear Frequency Modulation of NbO2-Based Nanoscale Oscillator With Li-Based Electrochemical Random Access Memory for Compact Coupled Oscillatory Neural Network / Donguk Lee, Myonghoon Kwak, Jongwon Lee, Jiyong Woo and Hyunsang Hwang / Frontiers in Neuroscience 2022(16), 939687 (202206)



Effect of the Oxygen Composition Control of HfOx Films on Threshold and Memory Switching Characteristics for Hybrid Memory Applications / Seungwoo Lee, Seong Hun Kim,Seungyeol Oh,Donghwa Lee,Hyunsang Hwang / Advanced Electronic Materials 8(5), 2101257 (202205)​


A grease for domain walls motion in HfO2-based ferroelectrics​ / Alireza Kashir, Mehrdad Ghiasabadi Farahani, Ján Lančok, Hyunsang Hwang, Stanislav Kamba​ / Nanotechnology​ 33(15),155703​ (202204) 


Improved Synaptic Characteristics of Oxide-Based Electrochemical Random Access Memory at Elevated Temperatures Using Integrated Micro-Heater / Jongwon Le,; Revannath Dnyandeo Nikam, Myonghoon Kwak, Hyunsang Hwang / IEEE Transactions on Electron Devices 69(4), pp. 2218-2221 (202204)​


Effect of Silicon Doping in B–Te (B4Te6) Binary Ovonic Threshold Switch System / Sanghyun Ban, Sangmin Lee, Jangseop Lee, and Hyunsang Hwang / IEEE Electron Device Letters 43(4), pp. 643-646 (202204) 


Strategies to Improve the Synaptic Characteristics of Oxygen-Based Electrochemical Random-Access Memory Based on Material Parameters Optimization / Jongwon Lee, Revannath Dnyandeo Nikam, Myonghoon Kwak, and Hyunsang Hwang / ACS Applied Materials and Interfaces 14(11), pp. 13450-13457 (202203)​


Two-step deposition of TiN capping electrodes to prevent degradation of ferroelectric properties in an in-situ crystallized TiN/Hf0.5Zr0.5O2/TiN device / Hyungwoo Kim, Alireza Kashir, Hojung Jang, Seungyeol Oh, Manoj Yadav, Seungwoo Lee and Hyunsang Hwang / Nano Express 3(1),015004 (202203) 


Determination of damage model parameters using nano- and bulk-scale digital image correlation and the finite element method / Gang Hee Gu, Jihye Kwon, Jongun Moon, Hyeonseok Kwon, Jongwon Lee, Yongju Kim, Eun Seong Kim, Min Hong Seo, Hyunsang Hwang, Hyoung Seop Kim / Journal of Materials Research and Technology 17, pp. 392-403 (202203)​


High polarization and wake-up free ferroelectric characteristics in ultrathin Hf0.5Zr0.5O2 devices by control of oxygen-deficient layer / Manoj Yadav, Alireza Kashir, Seungyeol Oh, Revannath Dnyandeo Nikam, Hyungwoo Kim, Hojung Jang, Hyunsang Hwang​ / ​Nanotechnology 33(8),085206 (202202) 


Prospect and challenges of analog switching for neuromorphic hardware / Writam Banerjee, Revannath Dnyandeo Nikam, and  Hyunsang Hwang / Applied Physics Letters 120(6), 060501 (202202) 


Enhanced switching characteristics of an ovonic threshold switching device with an ultra-thin MgO interfacial layer / Jangseop Lee, Sangmin Lee, Myonghoon Kwak, Wooseok Choi, Oleksandr Mosendz, Hyunsang Hwang​ / IEEE Electron Device Letters​  43(2), pp. 220-223 (​​202202) 

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