Semiconductor Integrated Device & Process Lab.

Journals

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Journals

149
Electrical and physical characteristics of PrTixOy for metal-oxide-semiconductor gate dielectric applications / Sanghun Jeon, Hyunsang Hwang / Applied Physics Letters 81 (25), pp. 4856-4858 (2002.12.16)
148
Atomic transport and stability during annealing of HfO2 and HfAlO with an ultrathin layer of SiO2 on Si(001) / Hyo Sik Chang, Hyunsang Hwang, Mann-ho Cho, Hyun Kyung Kim, Dae Won Moon / Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films 22 (1), pp. 165-169 (2004.01)
147
Thermal stability and decomposition of the HfO2–Al2O3 laminate system / Hyo Sik Chang, Hyunsang Hwang, Mann-Ho Cho, Dae Won Moon, Seok Joo Doh, Jong Ho Lee, Nae-In Lee / Applied Physics Letters 84 (1), pp. 28-30 (2004.01.05)
146
Fabrication of 50 nm Trigate Silicon On Insulator Metal–Oxide–Silicon Field-Effect Transistor without Source/Drain Activation Annealing / Kiju Im, Won-Ju Cho, Chang-Geun Ahn, Jong-Heon Yang, Jihun Oh, Seongjae Lee, Hyunsang Hwang / Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers 43 (5 A), pp. 2438-2441 (2004.05.15)
145
Electrical and Physical Properties of HfO2 Deposited via ALD Using Hf(OtBu)4 and Ozone atop Al2O3 / H. S. Chang, S.-K. Baek, H. Park, H. Hwang, J. H. Oh, W. S. Shin, J. H. Yeo, K. H. Hwang, S. W. Nam, H. D. Lee, C. L. Song, D. W. Moon, M.-H. Cho / Electrochemical and Solid-State Letters 7 (6), pp. F42-F44 (2004.06)
144
Electronic structures of high-k transition metal silicates: first-principles calculations / C. B. Samantaray, Hyunjun Sim, Hyunsang Hwang / Microelectronics Journal 35 (8), pp. 655-658 (2004.08)
143
Electronic structure and optical properties of barium strontium titanate (BaxSr1−xTiO3) using first-principles method / C.B. Samantaray, H. Sim, H. Hwang / Physica B: Condensed Matter 351 (1-2), pp. 158-162 (2004.08.15)
142
Ultrashallow p+/n Junction Formation by 0.5–1 keV Ion Implantation / Jihwan Park, Jeong-Youb Lee, Kilho Lee, Hyunsang Hwang / Japanese Journal of Applied Physics, Part 2: Letters 37 (11 SUPPL. B), pp. L1376-L1378 (1998.11.15)
141
Effect of Hydrogen Partial Pressure on the Reliability Characteristics of Ultrathin Gate Oxide / Jihwan Park, Yun Jun Huh, Hyunsang Hwang / Japanese Journal of Applied Physics, Part 2: Letters 37 (11 SUPPL. B), pp. L1347-L1349 (1998.11.15)
140
High-quality ultrathin gate oxide prepared by oxidation in D2O / Hyojune Kim, Hyunsang Hwang / Applied Physics Letters 74 (5), pp. 709-710 (1999.02.01)
139
Electrical and Reliability Characteristics of Ultrathin Gate Oxide Prepared by Oxidation in D2O / Hyojune Kim, Hyunsang Hwang / Japanese Journal of Applied Physics, Part 2: Letters 38 (2 A), pp. L99-L101 (1999.02.01)
138
Comparison of ultralow-energy ion implantation of boron and BF2 for ultrashallow p+/n junction formation / Jihwan Park, Yun-Jun Huh, Hyunsang Hwang / Applied Physics Letters 74 (9), pp. 1248-1250 (1999.03.01)
137
Effect of statistical process variation of MOSFET on hot carrier lifetime / Hyojune Kim, Hyunsang Hwang / Solid-State Electronics 43 (5), pp. 989-991 (1999.05)
136
Hot carrier reliability characteristics of a bend-gate MOSFET  / Woosung Lee, Hyunsang Hwang / Solid-State Electronics 44 (6), pp. 1117-1119 (2000.06.01)
135
Electromigration-induced failure of GaN multi-quantum well light emitting diode / Hyunsoo Kim, Hyundoek Yang, Chul Huh, Sang-Woo Kim, Seong-Ju Park, Hyunsang Hwang / Electronics Letters 36 (10), pp. 908-910 (2000.05.11)
134
Hot carrier degradation for narrow width MOSFET with shallow trench isolation / Woosung Lee, Hyunsang Hwang / Microelectronics Reliability 40 (1), pp. 49-56 (2000.01.14)
133
Electrical characteristics of ultrathin gate oxide prepared by postoxidation annealing in ND3 / Hyungshin Kwon, Hyunsang Hwang  / Applied Physics Letters 76 (6), pp. 772-773 (2000.02.07)
132
Electrical characteristics of an ultrathin (1.6 nm) TaOxNy gate dielectric / Hyungsuk Jung, Kiju Im, Hyunsang Hwang, Dooyoung Yang / Applied Physics Letters 76 (24), pp. 3630-3631 (2000.06.12)
131
Characterization of sub-30 nm p+/n junction formed by plasma ion implantation / S. K. Baek, C. J. Choi, T.-Y. Seong, H. Hwang, H. K. Kim, D. W. Moon / Journal of the Electrochemical Society 147 (8), pp. 3091-3093 (2000.08)
130
Modeling of a GaN-based light-emitting diode for uniform current spreading / Hyunsoo Kim, Ji-Myon Lee, Chul Huh, Sang-Woo Kim, Dong-Joon Kim, Seong-Ju Park, Hyunsang Hwang / Applied Physics Letters, 77 (12), pp. 1903-1904 (2000.09.18)